Fabrication of hybrid n-ZnMgO/n-ZnO/p-AlGaN/p-GaN light-emitting diodes

被引:37
作者
Yang, HS
Han, SY
Heo, YW
Baik, KH
Norton, DP
Pearton, SJ [1 ]
Ren, F
Osinsky, A
Dong, JW
Hertog, B
Dabiran, AM
Chow, PP
Chernyak, L
Steiner, T
Kao, CJ
Chi, GC
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
[2] Univ Florida, Dept Chem Engn, Gainesville, FL 32611 USA
[3] SVT Associates, Eden Prairie, MN 55344 USA
[4] Univ Cent Florida, Dept Phys, Orlando, FL 32819 USA
[5] AFOSR, Arlington, VA 22203 USA
[6] Natl Cent Univ, Dept Phys, Chungli 32054, Taiwan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 10期
关键词
ZnO; GaN; UV emitter; light-emitting diodes (LEDs); heterostructure;
D O I
10.1143/JJAP.44.7296
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the fabrication of UV light-emitting diodes (LEDs) based on a p-n junction n-ZnMgO/n-ZnO/p-AlGaN/p-GaN semiconductor triple-heterostructure. Radio-frequency plasma-assisted molecular beam epitaxy was used to grow the complete heterostructure on p-AlGaN/p-GaN c-plane sapphire templates. Cross-sectional transmission electron microscopy showed single-crystal quality of the pseudomorphically grown ZnO active region of the device. The LEDs were fabricated by a process involving both wet and dry etching. Electroluminescence emission most likely associated with ZnO excitonic transition was observed up to 370 degrees C. The results show the potential of ZnO-based materials for UV emitters of potentially lower cost and with comparable or higher emission intensity than comparable AlGaN/GaN devices.
引用
收藏
页码:7296 / 7300
页数:5
相关论文
共 39 条
[1]   Fabrication and characterization of n-ZnO/p-AlGaN heterojunction light-emitting diodes on 6H-SiC substrates [J].
Alivov, YI ;
Kalinina, EV ;
Cherenkov, AE ;
Look, DC ;
Ataev, BM ;
Omaev, AK ;
Chukichev, MV ;
Bagnall, DM .
APPLIED PHYSICS LETTERS, 2003, 83 (23) :4719-4721
[2]   Observation of 430 nm electroluminescence from ZnO/GaN heterojunction light-emitting diodes [J].
Alivov, YI ;
Van Nostrand, JE ;
Look, DC ;
Chukichev, MV ;
Ataev, BM .
APPLIED PHYSICS LETTERS, 2003, 83 (14) :2943-2945
[3]   Nitrogen-doped p-type ZnO layers prepared with H2O vapor-assisted metalorganic molecular-beam epitaxy [J].
Ashrafi, ABMA ;
Suemune, I ;
Kumano, H ;
Tanaka, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 2002, 41 (11B) :L1281-L1284
[4]   Electrical characterization of 1.8 MeV proton-bombarded ZnO [J].
Auret, FD ;
Goodman, SA ;
Hayes, M ;
Legodi, MJ ;
van Laarhoven, HA ;
Look, DC .
APPLIED PHYSICS LETTERS, 2001, 79 (19) :3074-3076
[5]   Formation of p-type ZnO film on InP substrate by phosphor doping [J].
Bang, KH ;
Hwang, DK ;
Park, MC ;
Ko, YD ;
Yun, I ;
Myoung, JM .
APPLIED SURFACE SCIENCE, 2003, 210 (3-4) :177-182
[6]   Layer-by-layer growth of ZnO epilayer on Al2O3(0001) by using a MgO buffer layer [J].
Chen, YF ;
Ko, HJ ;
Hong, SK ;
Yao, T .
APPLIED PHYSICS LETTERS, 2000, 76 (05) :559-561
[7]   Plasma assisted molecular beam epitaxy of ZnO on c-plane sapphire: Growth and characterization [J].
Chen, YF ;
Bagnall, DM ;
Koh, HJ ;
Park, KT ;
Hiraga, K ;
Zhu, ZQ ;
Yao, T .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (07) :3912-3918
[8]   Realization of band gap above 5.0 eV in metastable cubic-phase MgxZn1-xO alloy films [J].
Choopun, S ;
Vispute, RD ;
Yang, W ;
Sharma, RP ;
Venkatesan, T ;
Shen, H .
APPLIED PHYSICS LETTERS, 2002, 80 (09) :1529-1531
[9]   Development of MgZnO-ZnO-AlGaN heterostructures for ultraviolet light emitting applications [J].
Dong, JW ;
Osinsky, A ;
Hertog, B ;
Dabiran, AM ;
Chow, PP ;
Heo, YW ;
Norton, DP ;
Pearton, SJ .
JOURNAL OF ELECTRONIC MATERIALS, 2005, 34 (04) :416-423
[10]   Uniaxial locked epitaxy of ZnO on the a face of sapphire [J].
Fons, P ;
Iwata, K ;
Yamada, A ;
Matsubara, K ;
Niki, S ;
Nakahara, K ;
Tanabe, T ;
Takasu, H .
APPLIED PHYSICS LETTERS, 2000, 77 (12) :1801-1803