Surface assessment of a chemically assisted ion beam etched InP sample using scanning electron microscopy and atomic force microscopy techniques

被引：0

作者：

Cokmak, B ^{[1
]}

Penty, RV ^{[1
]}

White, IH ^{[1
]}

机构：

[1] Ataturk Univ, Muhendislik Fak, Elekt Haberlesme Bolumu, TR-25240 Erzurum, Turkey

来源：

CLEO(R)/PACIFIC RIM 2001, VOL II, TECHNICAL DIGEST | 2001年

关键词：

D O I：

暂无

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

This paper reports smooth chemically assisted ion beam etching (CAIBE) of InP material. The quality of the etched structures are investigated by using SEM (Scanning Electron Microscopy) and Atomic Force Microscopy (AFM) measurements.

引用

页码：224 / 225

页数：2

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