Lifetime measurements of CFx radicals and H atoms in afterglow of CF4/H2 plasmas

被引：12

作者：

Sasaki, K ^{[1
]}

Usui, K ^{[1
]}

Furukawa, H ^{[1
]}

Suzuki, C ^{[1
]}

Kadota, K ^{[1
]}

机构：

[1] Nagoya Univ, Dept Elect, Nagoya, Aichi 4648603, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1998年 / 37卷 / 9A期

关键词：

CFx; radicals; H atom; lifetime; surface loss probability; reaction between CFx and H; afterglow; CF4/H-2; plasmas;

D O I：

10.1143/JJAP.37.5047

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Decay time constants of CFx radical and H atom densities were measured in the afterglow of high-density CF4 plasmas following the addition of H-2. The lifetimes of CFx and H for high H-2 partial percentages (> 25%) were several tens of times longer than those for low H-2 partial percentages (<15%). The long lifetimes of both CFx and H observed for high H-2 percentages suggest that the rate coefficient for the gas-phase reaction CFx + H --> CFx-1 + HF is much smaller than the values reported in literature.

引用

页码：5047 / 5048

页数：2

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