Epitaxial growth of Nb films and Nb/Cu bilayers on Al2O3 substrates by DC magnetron sputtering

被引：3

作者：

Loloee, R ^{[1
]}

Crimp, MA ^{[1
]}

Zhu, W ^{[1
]}

Pratt, WP ^{[1
]}

机构：

[1] Michigan State Univ, Dept Mech & Mat Sci, E Lansing, MI 48824 USA

来源：

MECHANISMS AND PRINCIPLES OF EPITAXIAL GROWTH IN METALLIC SYSTEMS | 1998年 / 528卷

关键词：

D O I：

10.1557/PROC-528-203

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Epitaxial single crystal Nb films have been grown by sputter deposition on(1 1 (2) over bar 0) sapphire substrates. Subsequently, high quality epitaxial Cu films, with two orientation variants, have been grown onto the epitaxial Nb films. The sputtered films have been characterized using atomic force microscopy, electron backscattered patterns, and conventional transmission electron microscopy.

引用

页码：203 / 208

页数：6

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