Regular pattern formation through the retraction and pinch-off of edges during solid-state dewetting of patterned single crystal films

被引:66
作者
Ye, Jongpil [1 ]
Thompson, Carl V. [1 ]
机构
[1] MIT, Dept Mat Sci & Engn, Cambridge, MA 02139 USA
来源
PHYSICAL REVIEW B | 2010年 / 82卷 / 19期
关键词
CAPILLARY INSTABILITIES; THIN-FILMS;
D O I
10.1103/PhysRevB.82.193408
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report the formation of regular patterns of metal lines via solid-state dewetting of lithographically patterned single-crystal Ni(110) films with square and cross shapes. During the solid-state dewetting, valleys develop behind retracting edges and eventually lead to pinch-off and formation of lines. Mass accumulation at convex pattern corners also leads to formation of lines. We show that the size of large-scale patterns and surface-energy anisotropy affect the smaller-scale dewetted structures in a deterministic way.
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页数:4
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