Simple vacuum heater and its application for annealing TiO2 films

被引：2

作者：

Liu, C ^{[1
]}

Macrander, A ^{[1
]}

机构：

[1] Argonne Natl Lab, User Program Div, Argonne, IL 60439 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2001年 / 19卷 / 05期

关键词：

D O I：

10.1116/1.1372898

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

A simple lamp heater design and use of permanent magnets to mount the heater to a commercial sputter deposition system are reported. The heater was applied to anneal a TiO2 thin film sample up to 350 degreesC. The annealing effect was evaluated using spectroscopic ellipsometry. The results were compared with that of another TiO2 sample grown under identical conditions but without aftergrowth annealing. The TiO2 samples were made by using reactive sputtering on a pure Ti target. (C) 2001 American Vacuum Society.

引用

页码：2703 / 2705

页数：3

共 6 条

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