Nanoscale hydrophobic recovery:: A chemical force microscopy study of UV/ozone-treated cross-linked poly(dimethylsiloxane)

被引:247
作者
Hillborg, H
Tomczak, N
Olàh, A
Schönherr, H
Vancso, GJ
机构
[1] Univ Twente, Fac Sci & Technol, NL-7500 AE Enschede, Netherlands
[2] Univ Twente, MESA Inst Nanotechnol, Dept Mat Sci & Technol Polymers, NL-7500 AE Enschede, Netherlands
关键词
D O I
10.1021/la035552k
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Chemical force microscopy (CFM) in water was used to map the surface hydrophobicity of UV/ozone-treated poly(dimethylsiloxane) (PDMS; Sylgard 184) as a function of the storage/recovery time. In addition to CFM pull-off force mapping, we applied indentation mapping to probe the changes in the normalized modulus. These experiments were complemented by results on surface properties assessed on the micrometer scale by X-ray photoelectron spectroscopy and water contact-angle measurements. Exposure times of less than or equal to30 min resulted in laterally homogeneously oxidized surfaces, which are characterized by an increased modulus and a high segmental mobility of PDMS. As detected on a sub-50-nm level, the subsequent "hydrophobic recovery" was characterized by a gradual increase in the pull-off forces and a decrease in the normalized modulus, approaching the values of unexposed PDMS after 8-50 days. Lateral imaging on briefly exposed PDMS showed the appearance of liquid PDMS in the form of droplets with an increasing recovery time. Longer exposure times (60 min) led to the formation of a hydrophilic silica-like surface layer. Under these conditions, a gradual surface reconstruction within the silica-like layer occurred with time after exposure, where a hydrophilic SiOx-enriched phase formed < 100-nm-sized domains, surrounded by a more hydrophobic matrix with lower normalized modulus. These results provide new insights into the lateral homogeneity of oxidized PDMS with a resolution in the sub-50-nm range.
引用
收藏
页码:785 / 794
页数:10
相关论文
共 79 条
  • [1] Investigation of the stiffness change in, the indentation force and the hydrophobic recovery of plasma-oxidized polydimethylsiloxane surfaces by tapping mode atomic force microscopy
    Bar, G
    Delineau, L
    Häfele, A
    Whangbo, MH
    [J]. POLYMER, 2001, 42 (08) : 3627 - 3632
  • [2] IMAGING SPECTROSCOPY WITH THE ATOMIC-FORCE MICROSCOPE
    BASELT, DR
    BALDESCHWIELER, JD
    [J]. JOURNAL OF APPLIED PHYSICS, 1994, 76 (01) : 33 - 38
  • [3] Beamson G., 1992, SCI ESCA300 DATABASE
  • [4] FUNCTIONAL-GROUP IMAGING BY ADHESION AFM APPLIED TO LIPID MONOLAYERS
    BERGER, CEH
    VANDERWERF, KO
    KOOYMAN, RPH
    DEGROOTH, BG
    GREVE, J
    [J]. LANGMUIR, 1995, 11 (11) : 4188 - 4192
  • [5] Printing patterns of proteins
    Bernard, A
    Delamarche, E
    Schmid, H
    Michel, B
    Bosshard, HR
    Biebuyck, H
    [J]. LANGMUIR, 1998, 14 (09) : 2225 - 2229
  • [6] Scratching the surface: Fundamental investigations of tribology with atomic force microscopy
    Carpick, RW
    Salmeron, M
    [J]. CHEMICAL REVIEWS, 1997, 97 (04) : 1163 - 1194
  • [7] Curious morphology of silicon-containing polymer films on exposure to oxygen plasma
    Chan, VZH
    Thomas, EL
    Frommer, J
    Sampson, D
    Campbell, R
    Miller, D
    Hawker, C
    Lee, V
    Miller, RD
    [J]. CHEMISTRY OF MATERIALS, 1998, 10 (12) : 3895 - 3901
  • [8] Micromechanical properties of elastic polymeric materials as probed by scanning force microscopy
    Chizhik, SA
    Huang, Z
    Gorbunov, VV
    Myshkin, NK
    Tsukruk, VV
    [J]. LANGMUIR, 1998, 14 (10) : 2606 - 2609
  • [9] Spontaneous formation of complex and ordered structures on oxygen-plasma-treated elastomeric polydimethylsiloxane
    Chua, DBH
    Ng, HT
    Li, SFY
    [J]. APPLIED PHYSICS LETTERS, 2000, 76 (06) : 721 - 723
  • [10] Delamarche E, 2001, ADV MATER, V13, P1164