Electrical conduction behavior of ferroelectric Bi3.25La0.75Ti3O12 thin films prepared by a metalorganic decomposition method

被引:9
|
作者
Kim, KT [1 ]
Kim, CI [1 ]
机构
[1] Chung Ang Univ, Sch Elect & Elect Engn, Seoul 156756, South Korea
关键词
BLT; thin film; MOD; FeRAM; electric properties;
D O I
10.1016/j.surfcoat.2003.08.021
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The voltage and temperature dependence of leakage currents densities of ferroelectric Bi3.25La0.75Ti3O12 (BLT) thin films using Pt electrode has been studied. The BLT thin films were prepared by metal organic decomposition (MOD) and the spin coating method onto a Pt/Ti/SiO2/Si substrate. X-Ray diffraction (XRD) studies revealed that BLT thin films were crystallized in the layered structure after annealing at 600 degreesC. The remanent polarization (2Pr) and coercive field of BLT films annealed at 650 degreesC were 25.66 muC/cm(2) and 84.75 kV/cm, respectively. The BLT thin films showed good fatigue endurance up to 3.5 X 10(9) bipolar cycling at 5 V and 50 kHz., The d.c. leakage current densities of the BLT thin films as a function of applied voltage and temperature can be explained by the Schottky emission model. The Schottky barrier height of the BLT thin films was estimated to be approximately 1.06 eV (C) 2003 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:774 / 778
页数:5
相关论文
共 50 条
  • [11] Effect of substitution of vanadium on the structure and electrical properties of Bi3.25La0.75Ti3O12 thin films
    X.J. Meng
    J.H. Ma
    J.L. Sun
    T. Lin
    J. Yu
    G.S. Wang
    J.H. Chu
    Applied Physics A, 2004, 78 : 1089 - 1091
  • [12] Effects of Nb doping on Bi4Ti3O12 and Bi3.25La0.75Ti3O12 ceramics and thin films:: Different ferroelectric and electrical properties
    Kim, JS
    Ahn, CW
    Lee, HJ
    Lee, SY
    Kang, SH
    Kim, IW
    Lee, KS
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2005, 46 (01) : 147 - 150
  • [13] Effect of Bi4Ti3O12 seeding layer on the structural and ferroelectric properties of Bi3.25La0.75TiO12 thin films fabricated by a metalorganic decomposition method
    Kim, KT
    Kim, CI
    THIN SOLID FILMS, 2004, 447 : 413 - 417
  • [14] Effect of bismuth excess on the crystallization of Bi3.25La0.75Ti3O12 thin films on Pt/Ti/SiO2/Si substrates
    Kim, KT
    Kim, CI
    MICROELECTRONIC ENGINEERING, 2004, 71 (3-4) : 266 - 271
  • [15] Effect of Annealing Temperature on the Properties of Sputtered Bi3.25La0.75Ti3O12 Thin Films
    Kang, Hyunil
    Song, Joontae
    TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, 2013, 14 (03) : 130 - 132
  • [16] Effects of excess bismuth addition on the ferroelectric properties and memory characteristics of Bi3.25La0.75Ti3O12 thin films fabricated by sputtering
    Yamaji, Toru
    Kobune, Masafumi
    Fukushima, Koji
    Tada, Hideto
    Yazawa, Tetsuo
    JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 2007, 51 (02) : 735 - 739
  • [17] Effects of sputtering conditions on microstructure and ferroelectric properties of RF-sputtered Bi3.25La0.75Ti3O12 thin films
    Wu Yunyi
    Yuan Xuetao
    Hua Zhiqiang
    Li Tao
    Wang Lei
    FRONTIERS OF MATERIALS, CHEMICAL AND METALLURGICAL TECHNOLOGIES, PTS 1 AND 2, 2012, 581-582 : 595 - 601
  • [18] Preparation and electrical properties of Bi3.25Pr0.75Ti3O12 ferroelectric thin films
    D. Wu
    A.D. Li
    T. Yu
    N.B. Ming
    Applied Physics A, 2004, 78 : 95 - 99
  • [19] The crystalline orientation and ferroelectric properties of Bi3.25La0.75Ti3O12 thin films mediated by the intermediate layer of LaNiO3
    Wang, J. B.
    Li, P. J.
    Zhong, X. L.
    APPLIED SURFACE SCIENCE, 2011, 257 (09) : 4171 - 4174
  • [20] Ferroelectric properties and leakage current mechanisms of Bi3.25La0.75Ti3O12 thin films with a-axis preferred orientation prepared by sol-gel method
    Kao, M. C.
    Chen, H. Z.
    Young, S. L.
    MATERIALS LETTERS, 2008, 62 (4-5) : 629 - 632