Multifunctional high-reflective and antireflective layer systems with easy-to-clean properties

被引:21
作者
Gloess, D. [1 ]
Frach, P. [1 ]
Gottfried, C. [1 ]
Klinkenberg, S. [1 ]
Liebig, J. -S. [1 ]
Hentsch, W. [2 ]
Liepack, H. [2 ]
Krug, M. [2 ]
机构
[1] Fraunhofer Inst Elektronenstrahl & Plasmatech FEP, D-01277 Dresden, Germany
[2] FHR Anlagenbau GmbH, D-01458 Ottendorf Okrilla, Germany
关键词
titanium dioxide; photocatalysis; pulse magnetron sputtering; antireflective coating; optical coating;
D O I
10.1016/j.tsf.2007.05.097
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
High-reflective (HR) and even more antireflective (AR) layer systems are in use for widespread applications. Multifunctional layer systems providing high optical functionality with an easy-to-clean or a self-cleaning behaviour would be preferable for many applications to avoid soiling of the surface. In this paper, the feasibility of fabrication by highly productive pulse magnetron sputtering, in an in-line coating plant is investigated. Easy-to-clean properties are achieved by a top layer of photocatalytic and photoinduced hydrophilic TiO2. Multifunctional HR layer systems were successfully deposited on glass and polyethylene terephthalate (PET) substrates at a low deposition temperature of 150 degrees C, demonstrating the possibility of coating certain polymer materials. Double-sided multifunctional AR layer systems with a single-sided photoinduced hydrophilic TiO2 top coating have a resulting reflectivity of about 3% and transmittance of about 97% in the visible range of light. (C) 2007 Elsevier B.V. All rights reserved.
引用
收藏
页码:4487 / 4489
页数:3
相关论文
共 5 条
[1]   High rate deposition of insulating TiO2 and conducting ITO films for optical and display applications [J].
Frach, P ;
Glöss, D ;
Goedicke, K ;
Fahland, M ;
Gnehr, WM .
THIN SOLID FILMS, 2003, 445 (02) :251-258
[2]   A versatile coating tool for reactive in-line sputtering in different pulse modes [J].
Frach, P ;
Goedicke, K ;
Gottfried, C ;
Bartzsch, H .
SURFACE & COATINGS TECHNOLOGY, 2001, 142 :628-634
[3]   Photocatalytic titanium dioxide thin films prepared by reactive pulse magnetron sputtering at low temperature [J].
Glöss, D ;
Frach, P ;
Zywitzki, O ;
Modes, T ;
Klinkenberg, S ;
Gottfried, C .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (1-4) :967-971
[4]   Pulse mode effects on crystallization temperature of titanium dioxide films in pulse magnetron sputtering [J].
Miyagi, T ;
Kamei, M ;
Ogawa, T ;
Mitsuhashi, T ;
Yamazaki, A ;
Sato, T .
THIN SOLID FILMS, 2003, 442 (1-2) :32-35
[5]  
OHSAKI H, 2005, P 5 INT WORKSH UT CO, P23