Assessing future technology requirements for rapid isolation and sourcing of faults

被引:0
作者
Gross, C [1 ]
Tobin, KW
Jensen, D
Mehta, D
机构
[1] Intel Corp, Fab 17, Hudson, MA 01479 USA
[2] Oak Ridge Natl Lab, Image Sci & Machine Vis Grp, Oak Ridge, TN 37831 USA
[3] SEMATECH, AMD, Austin, TX 78741 USA
[4] Semicond Res Corp, Res Triangle Pk, NC USA
来源
MICRO | 1998年 / 16卷 / 07期
关键词
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:57 / +
页数:7
相关论文
共 7 条
  • [1] BENNETT MH, 1995, P SOC PHOTO-OPT INS, V2439, P210, DOI 10.1117/12.209203
  • [2] Butler S.W., 1997, Future Fab International, V1, P315
  • [3] DIEBOLD AC, 1997, FUTURE FAB INT, V1, P227
  • [4] GLEASON SS, 1998, SPIES 23 INT S MICR
  • [5] Tobin KW, 1997, P SOC PHOTO-OPT INS, V3050, P434, DOI 10.1117/12.275936
  • [6] TOBIN KW, 1997, FUTURE FAB INT, V1, P313
  • [7] 1997, NATL TECHNOLOGY ROAD