Control over pattern fidelity and surface wettability of imprinted templates for flexible color filter manufacturing

被引:15
作者
Bessonov, Aleksander [1 ]
Seo, Jung-Woo [1 ]
Kim, Jeong-Gil [1 ]
Hwang, Eun-Soo [1 ]
Lee, Jong-Woo [1 ]
Cho, Jong-Woo [1 ]
Kim, Dae-Jung [1 ]
Lee, Sukwon [1 ]
机构
[1] Samsung Elect Co Ltd, Mfg Technol Ctr, Patterning Grp, Suwon 443742, Gyeonggi Do, South Korea
关键词
Roll-to-roll lithography; Imprinting; Patterning; Pattern fidelity; Wettability contrast; ROLL-TO-ROLL; NANOIMPRINT LITHOGRAPHY; POLYMER FLOW; DESIGN;
D O I
10.1016/j.mee.2011.03.157
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper presents a universal approach for fabricating flexible color filter template with the high-fidelity patterns using R2R NIL in combination with microcontact printing which provides a solution for selective surface hydrophobization. The pattern transfer fidelity being critical in color filter manufacturing, as a function of imprinting parameters such as a roller pressure and web speed, is thoroughly investigated. We also discuss influence of various imprint resins, the thermal exposure and oxygen RIE on vertical dimensions measured using white-light scanning interferometer. Through the evaluation of all measurements of pattern height, the optimal R2R NIL process parameters are determined. By increasing the roll pressure and reducing the web speed, the pattern fidelity of a polymeric template is improved, reaching 93% of the original pattern height. The patterned surface is modified to achieve hydrophilicity and then locally printed with hydrophobic SAM. Channels become hydrophobic with WCA of 105 degrees on the top and the uncoated regions at the bottom remain hydrophilic with WCA of 21 degrees, exhibiting selective wetting. A high wettability contrast facilitates uniform ink filling into the channels and prevents ink diffusion during inkjet printing. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:2913 / 2918
页数:6
相关论文
共 25 条
[1]   High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates [J].
Ahn, Se Hyun ;
Guo, L. Jay .
ADVANCED MATERIALS, 2008, 20 (11) :2044-+
[2]   Large-Area Roll-to-Roll and Roll-to-Plate Nanoimprint Lithography: A Step toward High-Throughput Application of Continuous Nanoimprinting [J].
Ahn, Se Hyun ;
Guo, L. Jay .
ACS NANO, 2009, 3 (08) :2304-2310
[3]   Microstructuring by microcontact printing and selective surface dewetting [J].
Benor, Amare ;
Wagner, Veit ;
Knipp, Dietmar .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (04) :1321-1326
[4]   Design of Patterned Surfaces with Selective Wetting Using Nanoimprint Lithography [J].
Bessonov, Aleksander ;
Kim, Jeong-Gil ;
Seo, Jung-Woo ;
Lee, Jong-Woo ;
Lee, Sukwon .
MACROMOLECULAR CHEMISTRY AND PHYSICS, 2010, 211 (24) :2636-2641
[5]   Effect of compositions and surface treatment on the jetting stability and color uniformity of ink-jet printed color filter [J].
Chang, CJ ;
Chang, SJ ;
Wu, FM ;
Hsu, MW ;
Chiu, WWW ;
Chen, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2004, 43 (12) :8227-8233
[6]   An inkjet printed stripe-type color filter of liquid crystal display [J].
Chen, Chin-Tai ;
Wu, Kuo-Hua ;
Lu, Chun-Fu ;
Shieh, Fanny .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2010, 20 (05)
[7]   Development of large area nano imprint technology by step and repeat process and pattern stitching technique [J].
Cho, Youngtae ;
Kwon, Sin ;
Seo, Jung-Woo ;
Kim, Jeong-Gil ;
Cho, Jung-Woo ;
Park, Jung-Woo ;
Kim, Hyuk ;
Lee, Sukwon .
MICROELECTRONIC ENGINEERING, 2009, 86 (12) :2417-2422
[8]   Ink stamping lithography using polydimethylsiloxane stamp by surface energy modification [J].
Choo, Byoung-Kwon ;
Song, Na-Young ;
Kim, Ki-Hwan ;
Choi, Jung-Su ;
Park, Kyu-Chang ;
Jang, Jin .
JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (19-25) :2879-2884
[9]   Kinetic study and new applications of UV radiation curing [J].
Decker, C .
MACROMOLECULAR RAPID COMMUNICATIONS, 2002, 23 (18) :1067-1093
[10]   Polymer viscoelasticity and residual stress effects on nanoimprint lithography [J].
Ding, Yifu ;
Ro, Hyun Wook ;
Douglas, Jack F. ;
Jones, Ronald L. ;
Hine, Daniel R. ;
Karim, Alamgir ;
Soles, Christopher L. .
ADVANCED MATERIALS, 2007, 19 (10) :1377-+