Multilayer EUV/x-ray polychromators for plasma diagnostics

被引：6
作者：
Shmaenok, LA
Platonov, YY
Salashchenko, NN
Sorokin, AA
Simanovskii, DM
Golubev, AV
Belik, VP
Bobashev, SV
Bijkerk, F
Louis, E
Meijer, FG
Etlicher, B
Grudsky, AY
机构：
[1] INST PHYS MICROSTRUCT,NIZHNII NOVGOROD 603600,RUSSIA
[2] EURATOM ASSOC,FOM,INST PLASMA PHYS,NL-3439 MN NIEUWEGEIN,NETHERLANDS
[3] ECOLE POLYTECH,F-91128 PALAISEAU,FRANCE
[4] SEIFERT ROENTGEN & KO AO,ST PETERSBURG 195220,RUSSIA
来源：
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 1996年 / 80卷
关键词：
D O I：
10.1016/0368-2048(96)02970-2
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Recent developments of multilayer polychromators for the EUV and the soft x-ray range are reported. Upgrading and optimization of multilayers and filters, and a modular design boosted applications at various plasma facilities. Results of experiments with short-pulse (laser, liner) and tokamak plasmas are presented.
引用
收藏
页码：259 / 262
页数：4
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