Adsorption Site-Dependent Mobility Behavior in Graphene Exposed to Gas Oxygen

被引:7
作者
Blechta, Vaclav [1 ,2 ]
Drogowska, Karolina A. [1 ]
Vales, Vaclav [1 ]
Kalbac, Martin [1 ]
机构
[1] ASCR, J Heyrovsky Inst Phys Chem, Vvi, Dolejskova 2155-3, Prague 18223 8, Czech Republic
[2] Palacky Univ, Fac Sci, Dept Phys Chem, Tr 17 Listopadu 12, Olomouc 77146, Czech Republic
关键词
FIELD-EFFECT TRANSISTORS; CHEMICAL-VAPOR-DEPOSITION; WALLED CARBON NANOTUBE; DOPED GRAPHENE; LAYER GRAPHENE; GROWN GRAPHENE; ENERGY SITES; LARGE-AREA; GRAPHITE; SUBSTRATE;
D O I
10.1021/acs.jpcc.8b06906
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Transport characteristics of graphene field-effect transistors were measured in situ in oxygen/nitrogen atmospheres and at various temperatures. Mobilities of holes were extracted from transport characteristics as well as the doping level depending on the time of graphene exposure to oxygen/nitrogen atmosphere. The hole mobility showed significant decrease upon the oxygen adsorption to low energy adsorption sites (sp(2) carbon); however, it remained unaffected by the oxygen adsorption to high-energy adsorption sites which are represented by defects, impurities, transfer residuals, edges, and functional groups on graphene. The Dirac point was upshifted for both the low- and high-energy adsorption events. Activation energy of oxygen adsorption/desorption was estimated from temperature-dependent desorption rate coefficients as 215 and 450 meV for the low- and high-energy adsorption sites, respectively.
引用
收藏
页码:21493 / 21499
页数:7
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