Hydrothermal growth of V2O5 photoactive films at low temperatures

被引：37

作者：

Vernardou, D. ^{[1
,2
,3
]}

Spanakis, E. ^{[1
,3
,4
]}

Kenanakis, G. ^{[1
,2
,4
]}

Koudoumas, E. ^{[2
,5
]}

Katsarakis, N. ^{[1
,2
,4
]}

机构：

[1] Technol Educ Inst Crete, Sch Appl Technol, Dept Sci, Iraklion 71004, Crete, Greece

[2] Technol Educ Inst Crete, Sch Appl Technol, Ctr Mat Technol & Laser, Iraklion 71004, Crete, Greece

[3] Univ Crete, Dept Mat Sci & Technol, Iraklion 71003, Crete, Greece

[4] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, Iraklion 71110, Crete, Greece

[5] Technol Educ Inst Crete, Dept Elect Engn, Iraklion 71004, Crete, Greece

来源：

MATERIALS CHEMISTRY AND PHYSICS | 2010年 / 124卷 / 01期

关键词：

Oxides; Chemical synthesis; Surface properties; VANADIUM PENTOXIDE NANOBELTS; OXIDE THIN-FILMS; ELECTROCHEMICAL PROPERTIES; PHOTOCATALYTIC ACTIVITY; OXIDATION; TIO2; COATINGS; SILICA; CVD; FEMTOSECOND;

D O I：

10.1016/j.matchemphys.2010.06.040

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

It is shown that the surface morphology and the photoactivity of hydrothermally grown V2O5 films at 95 degrees C are greatly affected by the deposition time. Well-defined phase of V2O5 films grown for a deposition period of 2 h were found to exhibit significant photocatalytic activity, degrading stearic acid by 57%. The films presented a relatively porous structure, appearing as a wall-like network. The correlation of deposition period with the structure, morphology and the photoinduced properties of the materials are discussed. (C) 2010 Elsevier B.V. All rights reserved.

引用

页码：319 / 322

页数：4

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