Hydrothermal growth of V2O5 photoactive films at low temperatures

被引：37
|
作者：
Vernardou, D. [1 ,2 ,3 ]
Spanakis, E. [1 ,3 ,4 ]
Kenanakis, G. [1 ,2 ,4 ]
Koudoumas, E. [2 ,5 ]
Katsarakis, N. [1 ,2 ,4 ]
机构：
[1] Technol Educ Inst Crete, Sch Appl Technol, Dept Sci, Iraklion 71004, Crete, Greece
[2] Technol Educ Inst Crete, Sch Appl Technol, Ctr Mat Technol & Laser, Iraklion 71004, Crete, Greece
[3] Univ Crete, Dept Mat Sci & Technol, Iraklion 71003, Crete, Greece
[4] Fdn Res & Technol Hellas, Inst Elect Struct & Laser, Iraklion 71110, Crete, Greece
[5] Technol Educ Inst Crete, Dept Elect Engn, Iraklion 71004, Crete, Greece
来源：
MATERIALS CHEMISTRY AND PHYSICS | 2010年 / 124卷 / 01期
关键词：
Oxides; Chemical synthesis; Surface properties; VANADIUM PENTOXIDE NANOBELTS; OXIDE THIN-FILMS; ELECTROCHEMICAL PROPERTIES; PHOTOCATALYTIC ACTIVITY; OXIDATION; TIO2; COATINGS; SILICA; CVD; FEMTOSECOND;
D O I：
10.1016/j.matchemphys.2010.06.040
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
It is shown that the surface morphology and the photoactivity of hydrothermally grown V2O5 films at 95 degrees C are greatly affected by the deposition time. Well-defined phase of V2O5 films grown for a deposition period of 2 h were found to exhibit significant photocatalytic activity, degrading stearic acid by 57%. The films presented a relatively porous structure, appearing as a wall-like network. The correlation of deposition period with the structure, morphology and the photoinduced properties of the materials are discussed. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码：319 / 322
页数：4
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