Growth of boron-doped-ZnO by RF magnetron sputtering for ClGS solar cells

被引:7
作者
Hur, Jae-Sung [1 ]
Kim, Jihye [1 ]
Jang, Samseok [1 ]
Song, Jung-Bin [1 ]
Byun, Dongjin [1 ]
Son, Chang-Sik [2 ]
Yun, Jae Ho [3 ]
Yoon, Kyung Hoon [3 ]
机构
[1] Korea Univ, Dept Mat Sci & Engn, Seoul 136713, South Korea
[2] Silla Univ, Dept Elect Mat Engn, Pusan 617736, South Korea
[3] Korea Inst Energy Res, Photovolta Res Grp, Taejon 305343, South Korea
关键词
B-doped ZnO; transparent conductive oxide (TCO); CIGS solar cell;
D O I
10.3938/jkps.53.442
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The cell performance of CuIn1-x. GaxSe2 (CIGS) thin-film solar cells fabricated using boron-doped ZnO window layers was evaluated. Boron-doped ZnO was deposited by RF magnetron sputtering using a zinc-oxide target containing 3 wt.% B2O3. Its resistivity was 1.36 x 10(-2) Q-cm and its transmittance was 85 similar to 89 % in the wavelength range from 400 nm to 1000 nm. The transmittance was higher in the near-infrared region than in the other regions. Thus, boron-doped ZnO thin films would be suitable for use as transparent window layers of CIGS solar cells having a higher quantum efficiency on the near-infrared region. The FF and the conversion efficiency were obtained from the J-V measurements and their values were 0.42 and 8.15 %, respectively.
引用
收藏
页码:442 / 445
页数:4
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