Cumulation effect of an electron beam generated in a high-voltage nanosecond discharge plasma in vacuum and gas diodes

被引：0
|
作者：
Lomaev, Mikhail I. [1 ,2 ]
Tarasenko, Victor F. [1 ,2 ]
Diatlov, Alexander V. [2 ]
Burachenko, Alexander G. [1 ]
机构：
[1] Inst High Current Elect, Tomsk 634055, Russia
[2] Natl Res Tomsk State Univ, Tomsk 634050, Russia
来源：
XIV INTERNATIONAL CONFERENCE ON PULSED LASERS AND LASER APPLICATIONS | 2019年 / 11322卷
关键词：
cumulation effect; electron beam; runaway electrons; high-voltage nanosecond discharge;
D O I：
10.1117/12.2548440
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Cumulation effect of a beam of runaway electrons formed in a high-voltage nanosecond discharge in air at pressures of 3-10(5) Pa and discharge gap length d of 1 - 5 mm was studied. Optimal conditions of the effect in discharge gap with a tubular potential cathode and grounded flat anode was achieved at an air pressure of similar to 5 Pa and d of 2.7 mm. An electron beam current pulse was recorded behind a foil anode with high (up to similar to 80 ps) time resolution. It was found that, due to the cumulation effect, a through hole is formed in an aluminum foil 20 mu m thick after 2-3 discharge pulses. The electron beam was found to register around the zone of maximum beam current density as well. As follows from the obtained results, energy of electrons of second part of electron beam current pulse is less than that of first part.
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页数：6
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