On the ion and neutral atom bombardment of the growth surface in magnetron plasma sputter deposition

被引：32

作者：

Van Hattum, E. D. ^{[1
]}

Palmero, A. ^{[1
]}

Arnoldbik, W. M. ^{[1
]}

Rudolph, H. ^{[1
]}

Habraken, F. H. P. M. ^{[1
]}

机构：

[1] Univ Utrecht, Fac Sci, Dept Phys & Astron, NL-3508 TC Utrecht, Netherlands

来源：

APPLIED PHYSICS LETTERS | 2007年 / 91卷 / 17期

关键词：

D O I：

10.1063/1.2801514

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The energy distribution of positive argon ions bombarding the substrate during radiofrequency magnetron sputter deposition has been measured as a function of the argon pressure. The results are related to measurements of the plasma potential distribution and understood invoking the occurrence of resonant charge transfer reactions. This effectively lowers the ion bombardment energy and causes the bombardment of the growth surface with neutrals of a few eV kinetic energy in the pressure range of 0.1-1 Pa. (C) 2007 American Institute of Physics.

引用

页数：3

共 15 条

[1]

ABRIL I, 1983, PHYS REV A, V28, P3766

[2] Energy distributions of positive and negative ions during magnetron sputtering of an Al target in Ar/O2 mixtures [J].

Andersson, Jon M. ;

Wallin, E. ;

Munger, E. P. ;

Helmersson, U. .

JOURNAL OF APPLIED PHYSICS, 2006, 100 (03)

[3] Interpretation of ion distribution functions measured by a combined energy and mass analyzer [J].

Ellmer, K ;

Wendt, R ;

Wiesemann, K .

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2003, 223 (1-3) :679-693

[4] On the production of energetic neutrals in the cathode sheath of direct-current discharges [J].

Ito, Tsuyohito ;

Cappelli, Mark A. .

APPLIED PHYSICS LETTERS, 2007, 90 (10)

[5] Ion energy distributions in rf sheaths; review, analysis and simulation [J].

Kawamura, E ;

Vahedi, V ;

Lieberman, MA ;

Birdsall, CK .

PLASMA SOURCES SCIENCE & TECHNOLOGY, 1999, 8 (03) :R45-R64

[6] THE THEORY OF CATHODIC BOMBARDMENT IN A GLOW-DISCHARGE BY FAST NEUTRALS [J].

MASON, RS ;

ALLOTT, RM .

JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1994, 27 (11) :2372-2378

[7] Ion heating in the presheath [J].

Meige, Albert ;

Sutherland, Orson ;

Smith, Helen B. ;

Boswell, Rod W. .

PHYSICS OF PLASMAS, 2007, 14 (03)

[8] Characterization of the plasma in a radio-frequency magnetron sputtering system [J].

Palmero, A ;

van Hattum, ED ;

Arnoldbik, WM ;

Vredenberg, AM ;

Habraken, FHPM .

JOURNAL OF APPLIED PHYSICS, 2004, 95 (12) :7611-7618

[9] One-dimensional analysis of the rate of plasma-assisted sputter deposition [J].

Palmero, A. ;

Rudolph, H. ;

Habraken, F. H. P. M. .

JOURNAL OF APPLIED PHYSICS, 2007, 101 (08)

[10] THE APPLICATION OF SCATTERING CROSS-SECTIONS TO ION FLUX MODELS IN DISCHARGE SHEATHS [J].

PHELPS, AV .

JOURNAL OF APPLIED PHYSICS, 1994, 76 (02) :747-753

← 1 2 →