A micromachined Kelvin probe for surface potential measurements in microfluidic channels and solid-state applications

被引:0
作者
Chu, LL [1 ]
Takahata, K [1 ]
Selvaganapathy, P [1 ]
Shohet, JL [1 ]
Gianchandani, YB [1 ]
机构
[1] Univ Michigan, Dept EECS, Ann Arbor, MI 48109 USA
来源
BOSTON TRANSDUCERS'03: DIGEST OF TECHNICAL PAPERS, VOLS 1 AND 2 | 2003年
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper reports on a micromachined Kelvin probe structure with integrated scanning tip and dither actuation mechanism. It is fabricated by a modified micro electrodischarge machining process which allows electrical isolation within the micromachined structure using epoxy plugs. The device is used to measure changes in the external surface potential of a parylene microfluidic channel as a function of varying pH of liquid inside the channel. A contact potential difference of approximate to 6 V is measured for a change in pH from 4 to 8 within the channel. The device is also used to map embedded charge in a thin SiO2 layer on a Si substrate, showing it to be suitable for monitoring microelectronics manufacturing processes.
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页码:384 / 387
页数:4
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