Modeling of diffused quantum wells vertical cavity surface emitting lasers

被引:1
|
作者
Yu, SF [1 ]
机构
[1] Univ Hong Kong, Dept Elect & Elect Engn, Hong Kong, Hong Kong
来源
PHYSICS AND SIMULATION OF OPTOELECTRONIC DEVICES VI, PTS 1 AND 2 | 1998年 / 3283卷
关键词
interdiffusion; quantum well semiconductor lasers; laser modeling; vertical cavity surface emitting lasers;
D O I
10.1117/12.316737
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A comprehensive numerical model for investigating the thermal, electrical and optical characteristics of vertical cavity surface emitting lasers with a diffused quantum wells structure is presented. In general, this model performs a self-consistent calculation of quasi 3D distribution of temperature, voltage and optical field. The quasi 2D diffusion and the recombination of carrier concentration inside the quantum well active layer are also introduced into the model. In particular, this model includes the calculation of the quasi 3D ion-implantation profile. In addition, the influence of impurity induced compositional disordering on the optical gain and refractive index of the quantum wells active layer is also taken into consideration. Using this model, the steady state characteristics of diffused quantum wells vertical cavity surface emitting lasers are studied theoretically. It is shown that significant improvement of stable single-mode operation can be obtained using diffused quantum wells structure.
引用
收藏
页码:841 / 848
页数:4
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