Phosphorus-diffused silicon solar cell emitters with plasma enhanced chemical vapor deposited silicon carbide

被引：13

作者：

Orpella, A ^{[1
]}

Vetter, M ^{[1
]}

Ferré, R ^{[1
]}

Martín, I ^{[1
]}

Puigdollers, J ^{[1
]}

Voz, C ^{[1
]}

Alcubilla, R ^{[1
]}

机构：

[1] Univ Politecn Cataluna, Dept Elect Engn, ES-08034 Barcelona, Spain

来源：

SOLAR ENERGY MATERIALS AND SOLAR CELLS | 2005年 / 87卷 / 1-4期

关键词：

amorphous silicon carbide (a-SIC : H(n)); solar cells; emitter saturation current density; passivation;

D O I：

10.1016/j.solmat.2004.08.021

中图分类号：

TE [石油、天然气工业]; TK [能源与动力工程];

学科分类号：

0807 ; 0820 ;

摘要：

We propose the use of annealed phosphorus doped amorphous silicon carbide layers (a-SiC:H(n)) deposited by PECVD as emitters in solar cells and explore the effect of the annealing time on the emitter saturation current density (J(OC)). We use the quasy-steady state photoconductance method to determine the dependence of effective lifetime on excess carrier density and from these measurements we obtain J(OC) values in the range of 300 fA cm(-2) for sheet resistances around 100 Omega/sq. Finally, we obtain effective surface recombination velocity values around 10(4) cm s(-1) by fitting the measured J(OC) values with PC1D simulated ones. (c) 2004 Elsevier B.V. All rights reserved.

引用

页码：667 / 674

页数：8

共 50 条

[31] Structural and light emitting properties of silicon-rich silicon nitride films grown by plasma enhanced-chemical vapor deposition
Torchynska, T. V.
Casas Espinola, J. L.
Khomenkova, L.
Vergara Hernandez, E.
Andraca Adame, J. A.
Slaoui, A.
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2015, 37 : 46 - 50
[32] Screen-printed silicon solar cells with texturized and passivated emitter diffused from spin-on phosphorus source
Zdanowicz, T
Lipinski, M
METAL/NONMETAL MICROSYSTEMS: PHYSICS, TECHNOLOGY, AND APPLICATIONS, 1996, 2780 : 265 - 269
[33] Effects of various substrate materials on microstructural and optical properties of amorphous silicon oxynitride thin films deposited by plasma-enhanced chemical vapor deposition
Hang, Liangyi
Liu, Weiguo
Xu, Junqi
Yang, Chen
Zhou, Shun
THIN SOLID FILMS, 2020, 709
[34] Bulk and Surface-Related Degradation in Lifetime Samples Made of Czochralski Silicon Passivated by Plasma-Enhanced Chemical Vapor Deposited Layer Stacks
Sperber, David
Schwarz, Anton
Herguth, Axel
Hahn, Giso
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018, 215 (24):
[35] Transient Phenomena in Plasma-Enhanced Chemical Vapor Deposition Processes of Thin-Film Silicon
Nunomura, Shota
Yoshida, Isao
Kondo, Michio
JAPANESE JOURNAL OF APPLIED PHYSICS, 2010, 49 (10) : 1061021 - 1061025
[36] Optimization of hydrogenated amorphous silicon germanium thin films and solar cells deposited by hot wire chemical vapor deposition
Veldhuizen, L. W.
Van der Werf, C. H. M.
Kuang, Y.
Bakker, N. J.
Yun, S. J.
Schropp, R. E. I.
THIN SOLID FILMS, 2015, 595 : 226 - 230
[37] Role of buffer layer on the performances of amorphous silicon solar cells with incorporated nanoparticles produced by plasma enhanced chemical vapor deposition at 27.12 MHz
Raniero, L
Zhang, S
Aguas, H
Ferreira, I
Igreja, R
Fortunato, E
Martins, R
THIN SOLID FILMS, 2005, 487 (1-2) : 170 - 173
[38] Effective Passivation of Black Silicon Surfaces via Plasma-Enhanced Chemical Vapor Deposition Grown Conformal Hydrogenated Amorphous Silicon Layer
Ozkol, Engin
Procel, Paul
Zhao, Yifeng
Mazzarella, Luana
Medlin, Rostislav
Sutta, Pavol
Isabella, Olindo
Zeman, Miro
PHYSICA STATUS SOLIDI-RAPID RESEARCH LETTERS, 2020, 14 (01):
[39] Effects of crystalline nanoparticle incorporation on growth, structure, and properties of microcrystalline silicon films deposited by plasma chemical vapor deposition
Kim, Yeonwon
Matsunaga, Takeaki
Nakahara, Kenta
Uchida, Giichiro
Kamataki, Kunihiro
Itagaki, Naho
Seo, Hyunwoong
Koga, Kazunori
Shiratani, Masaharu
THIN SOLID FILMS, 2012, 523 : 29 - 33
[40] Evolution of structural and optical properties of nanostructured silicon carbon films deposited by plasma enhanced chemical vapour deposition
Ambrosone, G.
Basa, D. K.
Coscia, U.
Passacantando, M.
THIN SOLID FILMS, 2012, 520 (15) : 4875 - 4879

← 1 2 3 4 5 →