Nanoindentation and FEM study of the effect of internal stress on micro/nano mechanical property of thin CNx films

被引:60
作者
Bai, MW [1 ]
Kato, K
Umehara, N
Miyake, Y
机构
[1] Tohoku Univ, Dept Engn Mech, Sendai, Miyagi 9808579, Japan
[2] Hitachi Ltd, Data Storage & Retrieval Syst Div, Odawara, Kanagawa 2568510, Japan
基金
日本学术振兴会;
关键词
hardness; surface stress; annealing; elastic properties;
D O I
10.1016/S0040-6090(00)01314-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Pursuit of ever-increasing storage density has lead to a steady reduction in head-disk separation which requires protective coating as thin and as hard as possible. It has been found that the internal stress affects micro-tribological properties of CNx film. In this study, thin hard CNx overcoats with different internal stress were synthesized by an ion beam assisted deposition method. Nanoindentation was used to evaluate the micro/nano mechanical properties of CNx film. The resultant load-displacement data was analyzed and it was found that the internal stress does affect the elastic modulus and hardness of CNx film according to the magnitude and type of internal stress. A finite element method was used to simulate the nanoindentation process and to examine the dependence of hardness and modulus on internal stress. Experimental results were compared with calculated results. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:138 / 147
页数:10
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