Nanochannels fabricated by high-intensity femtosecond laser pulses on dielectric surfaces

被引:31
作者
Kudryashov, Sergey I. [1 ]
Mourou, Gerard
Joglekar, Ajit
Herbstman, Jeffrey F.
Hunt, Alan J.
机构
[1] Russian Acad Sci, PN Lebedev Phys Inst, Moscow 119991, Russia
[2] ENSTA Ecole Polytech, Lab Opt Appl, F-91761 Palaiseau, France
[3] Univ Michigan, Dept Biomed Engn, Ctr Ultrafast Opt Sci, Ann Arbor, MI 48109 USA
基金
美国国家科学基金会;
关键词
D O I
10.1063/1.2790741
中图分类号
O59 [应用物理学];
学科分类号
摘要
Direct scanning electron microscopy examination reveals a complex structure of narrow, micron-deep, internal nanochannels within shallow, nanoscale, external craters fabricated on glass and sapphire surfaces by single high-intensity femtosecond laser pulses, with nearly the same intensity thresholds for both features. Formation of the channels is accompanied by extensive expulsion of molten material produced via surface spallation and phase explosion mechanisms, and redeposited around the corresponding external craters. Potential mechanisms underlying fabrication of the unexpectedly deep channels in dielectrics are considered. (C) 2007 American Institute of Physics.
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页数:3
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