PVT-growth and characterization of single crystalline 3C-SiC on a (0001) 6H-SiC substrate

被引:6
作者
Polychroniadis, E [1 ]
Mantzari, A
Freudenberg, A
Wollweber, J
Nitschke, R
Frank, T
Pensl, G
Schöner, A
机构
[1] Aristotle Univ Thessaloniki, Dept Phys, Thessaloniki 54124, Greece
[2] Inst Kristallzuchtung, D-12489 Berlin, Germany
[3] Univ Erlangen Nurnberg, IAP, D-91058 Erlangen, Germany
[4] ACREO AB, S-16440 Kista, Sweden
来源
SILICON CARBIDE AND RELATED MATERIALS 2004 | 2005年 / 483卷
关键词
characterization; defects; interfaces; substrates; growth from vapor;
D O I
10.4028/www.scientific.net/MSF.483-485.319
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The aim of the present work is to grow 3C-SiC on (0001) 6H-SiC seeds using the Physical Vapour Transport (PVT) method and to study the electrical and structural properties of the grown material. Photoluminescence (PL)-mappings reveal that the overgrown layer consists predominantly of the 3C-SiC polytype and capacitance-voltage (C-V) measurements result in a net nitrogen donor concentration of 1 x 10(16) cm(-3). Transmission Electron Microscopy (TEM) observations also confirm that the overgrown layer is of the 3C-SiC polytype having the cubic [111] crystallographic direction parallel to the c-axis of the 6H-SiC substrate. In some cases, twin crystals of 3C-SiC are formed immediately after the interface and, in a few cases, small 6H-SiC inclusions are observed in the cubic film having the same orientation as the substrate. The film near the substrate/overgrown interface shows a high density of defects such as dislocations and stacking faults (SF's), which propagate into the overgrown layer. Finally although there is a rapid decrease of the defect density within the first 60 mu m from the interface, the SF density remains almost constant within the last 100 mu m below the surface.
引用
收藏
页码:319 / 322
页数:4
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