Determination of the states of oxidation of metals in thin oxide films by X-ray photoelectron spectroscopy

被引：42

作者：

Alov, NV ^{[1
]}

机构：

[1] Moscow MV Lomonosov State Univ, Dept Chem, Moscow 119992, Russia

来源：

JOURNAL OF ANALYTICAL CHEMISTRY | 2005年 / 60卷 / 05期

关键词：

D O I：

10.1007/s10809-005-0114-x

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

The states of oxidation of molybdenum, tungsten, niobium, and tantalum in thin oxide films of variable composition were determined by X-ray photoelectron spectroscopy. It was found that the metals occurred in different states of oxidation in thin oxide films prepared by the irradiation of metal surfaces with low-energy oxygen ions under high-vacuum conditions. The concentrations of metals in different states of oxidation essentially depend on the radiation dose and the reactivity of metals.

引用

页码：431 / 435

页数：5

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