Reflection high-energy electron diffraction pattern of GaN grown on 6H-SiC by metalorganic molecular beam epitaxy using AlGaN template

被引:1
作者
Honda, T [1 ]
Kawanishi, H [1 ]
机构
[1] Kohgakuin Univ, Dept Elect Engn, Tokyo 1920015, Japan
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2003年 / 21卷 / 04期
关键词
D O I
10.1116/1.1585076
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Refraction high-energy diffraction (RHEED) patterns of GaN layers during the growth by metalorganic molecular beam epitaxy using (0001)6H-SiC and metalorganic vapor phase epitaxy grown Al0.05Ga0.95N/(0001)6H-SiC as substrates are observed. The patterns in initial growth are different for the GaN layers grown on 6H-SiC substrate and AlGaN template. The in-plane lattice constants of grown GaN layers estimated the duration of RHEED patterns are also discussed. (C) 2003 American Vacuum Society.
引用
收藏
页码:1822 / 1824
页数:3
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