Fabrication and characterization of SiO2(f)/Si3N4 composites

A silicon dioxide fiber-reinforced silicon nitride matrix (SiO2/Si3N4) composite used for radomes was prepared by chemical vapor infiltration (M) process using the SiCl4-NH3-H-2 system. The effects of the process conditions, including infiltration temperature, infiltration time, and gas flux were investigated. The energy dispersion spectra (EDS) result showed that the main elements of this composite contained Si, N, and O. The X-ray diffraction (XRD) results indicated that phases of the composite before and after treatment at 1350 degrees C were all amorphous. A little fiber pull-out was observed on the cross section of the composite by scan electron microscope (SEM). As a result, the composite exhibited good thermal stability, but an appropriate interface was necessary between the fiber and the matrix.