Preparation of hydrophobic optical silica thin film with sol-gel method

被引：7

作者：

Ma, JH ^{[1
]}

Wu, GM ^{[1
]}

Cheng, YB ^{[1
]}

Sun, Q ^{[1
]}

Wang, JL ^{[1
]}

Shen, J ^{[1
]}

Wang, J ^{[1
]}

机构：

[1] Tongji Univ, Pohl Inst Solid State Phys, Shanghai 200092, Peoples R China

来源：

ACTA PHYSICO-CHIMICA SINICA | 2001年 / 17卷 / 12期

关键词：

sol-gel process; silica; surface modification; hydrophobic films;

D O I：

10.3866/PKU.WHXB20011211

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Preparation of hydrophobic SiO2 thin film is reported. The solution is prepared by a acid/base 2-step method and then modified by TMCS (trimethylchlorosilane). Ellipsometry, FTIR, SEM, and contact angle instrument were used to measure the physical properties of the thin films. The results show that the refractive index of thin film is controlled between 1.33 and 1.18, OH groups on the surface of SiO2 particles have been partly replaced by CH3 groups, the contact angle is increased to 120 degree of modified films from 40 degree of unmodified films.

引用

页码：1112 / 1116

页数：5

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