Slab Thickness Effects for the Clean and Adsorbed Ge(001) Surface with Comparison to Si(001)

被引:11
作者
Shah, G. Ali [1 ]
Radny, Marian W. [1 ,2 ]
Smith, Phillip V. [1 ]
Schofield, Steven R. [3 ,4 ]
机构
[1] Univ Newcastle, Sch Math & Phys Sci, Callaghan, NSW 2308, Australia
[2] Poznan Tech Univ, Inst Phys, Poznan, Poland
[3] UCL, London Ctr Nanotechnol, London WC1H 0AH, England
[4] UCL, Dept Phys & Astron, London WC1E 6BT, England
基金
英国工程与自然科学研究理事会;
关键词
TOTAL-ENERGY CALCULATIONS; WAVE BASIS-SET; GERMANIUM; SILICON; METALS;
D O I
10.1021/jp208247m
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Quantum confinement effects on the electronic structure of thin Ge(001) slabs with one clean and one H-terminated surface are discussed based on density functional theory calculations for periodic slabs. Recent work has shown that while the geometry of the clean Ge(001) surface is reliably reproduced by relatively thin asymmetric slabs, the associated electronic structure can be quite sensitive to the number of layers in the slab. Here we show that the changes in the character and energy of the states near the Fermi energy of such slabs are related to the description of the bulk states and the width of the valence band, both of which are sensitive to the thickness of the slabs. Calculations performed for an isolated H or Cl atom adsorbed on the surface of a Ge(001) slab show that the effect of bulk electron confinement within thin slabs significantly influences the geometries, electronic structures, and relative thermodynamic stability of the single-atom adsorbates and the associated reconstructed surface. By contrast, the corresponding Si(001) surface does not exhibit any significant slab thickness dependence. We believe that these differences are a direct consequence of the nature of the states in the vicinity of the Fermi energy. Our results highlight the importance of employing an appropriate number of layers in slab calculations of the Ge(001) surface and imply that the surface electronic properties of Ge(001) slabs may be manipulated by employing a thin film technology.
引用
收藏
页码:6615 / 6622
页数:8
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共 20 条
  • [1] DIMENSIONALITY AND SIZE EFFECTS IN SIMPLE METALS
    BATRA, IP
    CIRACI, S
    SRIVASTAVA, GP
    NELSON, JS
    FONG, CY
    [J]. PHYSICAL REVIEW B, 1986, 34 (12): : 8246 - 8257
  • [2] Porous silicon: a quantum sponge structure for silicon based optoelectronics
    Bisi, O
    Ossicini, S
    Pavesi, L
    [J]. SURFACE SCIENCE REPORTS, 2000, 38 (1-3) : 1 - 126
  • [3] Controlled Coupling and Occupation of Silicon Atomic Quantum Dots at Room Temperature
    Haider, M. Baseer
    Pitters, Jason L.
    DiLabio, Gino A.
    Livadaru, Lucian
    Mutus, Josh Y.
    Wolkow, Robert A.
    [J]. PHYSICAL REVIEW LETTERS, 2009, 102 (04)
  • [4] Electronic properties of germanium quantum films
    Kholod, AN
    Saúl, A
    Fuhr, JD
    Borisenko, VE
    d'Avitaya, FA
    [J]. PHYSICAL REVIEW B, 2000, 62 (19) : 12949 - 12954
  • [5] Appearance of direct gap in silicon and germanium nanosize slabs
    Kholod, AN
    Borisenko, VE
    Saúb, A
    d'Avitaya, FA
    Fuhr, J
    [J]. OPTICAL MATERIALS, 2001, 17 (1-2) : 61 - 63
  • [6] AB-INITIO MOLECULAR-DYNAMICS SIMULATION OF THE LIQUID-METAL AMORPHOUS-SEMICONDUCTOR TRANSITION IN GERMANIUM
    KRESSE, G
    HAFNER, J
    [J]. PHYSICAL REVIEW B, 1994, 49 (20): : 14251 - 14269
  • [7] Efficient iterative schemes for ab initio total-energy calculations using a plane-wave basis set
    Kresse, G
    Furthmuller, J
    [J]. PHYSICAL REVIEW B, 1996, 54 (16): : 11169 - 11186
  • [8] Efficiency of ab-initio total energy calculations for metals and semiconductors using a plane-wave basis set
    Kresse, G
    Furthmuller, J
    [J]. COMPUTATIONAL MATERIALS SCIENCE, 1996, 6 (01) : 15 - 50
  • [9] Reactivity of the germanium surface: Chemical passivation and functionalization
    Loscutoff, Paul W.
    Bent, Stacey F.
    [J]. ANNUAL REVIEW OF PHYSICAL CHEMISTRY, 2006, 57 : 467 - 495
  • [10] Impact of Body-Thickness-Dependent Band Structure on Scaling of Double-Gate MOSFETs: A DFT/NEGF Study
    Martinez, Antonio
    Kalna, Karol
    Sushko, Peter V.
    Shluger, Alex L.
    Barker, John R.
    Asenov, Asen
    [J]. IEEE TRANSACTIONS ON NANOTECHNOLOGY, 2009, 8 (02) : 159 - 166