Micro-tribo-mechanical properties of nanocrystalline TiN thin films for small scale device applications

被引：27
作者：
Kumar, D. Dinesh [1 ,2 ]
Kumar, N. [3 ]
Kalaiselvam, S. [2 ]
Dash, S. [3 ]
Jayavel, R. [1 ]
机构：
[1] Anna Univ, Ctr Nanosci & Technol, Madras 600025, Tamil Nadu, India
[2] Anna Univ, Dept Appl Sci & Technol, Madras 600025, Tamil Nadu, India
[3] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India
来源：
TRIBOLOGY INTERNATIONAL | 2015年 / 88卷
关键词：
Nanocrystalline TiN film; Nanohardness; Friction/wear; ELECTRICAL-PROPERTIES; COATINGS; NITROGEN; MEMS; FRICTION;
D O I：
10.1016/j.triboint.2015.02.031
中图分类号：
TH [机械、仪表工业];
学科分类号：
0802 ;
摘要：
Nanocrystalline titanium nitride (TiN) thin films were deposited on Si (100) substrates using reactive DC magnetron sputtering. Microstructure of the film was modified by adjusting the N-2 flow rate during the deposition. At low flow rate, hexagonal-closed-packed (HCP)-Ti and alpha-Ti2N phases were formed. At higher N-2 flow rate, the FCC-TiN single phase was formed predominantly. FCC-TiN film showed high hardness and elastic modulus due to covalently bonded TiN cubic phase and grain size refinement. In humid atmosphere, ultra-low friction coefficient similar to 0.025 with high wear resistance was measured in the film consisting of HCP-Ti and alpha-Ti2N phases while the hardness was 12.7 GPa. (C) 2015 Elsevier Ltd. All rights reserved.
引用
收藏
页码：25 / 30
页数：6
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