Micro-tribo-mechanical properties of nanocrystalline TiN thin films for small scale device applications

被引：28

作者：

Kumar, D. Dinesh ^{[1
,2
]}

Kumar, N. ^{[3
]}

Kalaiselvam, S. ^{[2
]}

Dash, S. ^{[3
]}

Jayavel, R. ^{[1
]}

机构：

[1] Anna Univ, Ctr Nanosci & Technol, Madras 600025, Tamil Nadu, India

[2] Anna Univ, Dept Appl Sci & Technol, Madras 600025, Tamil Nadu, India

[3] Indira Gandhi Ctr Atom Res, Mat Sci Grp, Kalpakkam 603102, Tamil Nadu, India

来源：

TRIBOLOGY INTERNATIONAL | 2015年 / 88卷

关键词：

Nanocrystalline TiN film; Nanohardness; Friction/wear; ELECTRICAL-PROPERTIES; COATINGS; NITROGEN; MEMS; FRICTION;

D O I：

10.1016/j.triboint.2015.02.031

中图分类号：

TH [机械、仪表工业];

学科分类号：

0802 ;

摘要：

Nanocrystalline titanium nitride (TiN) thin films were deposited on Si (100) substrates using reactive DC magnetron sputtering. Microstructure of the film was modified by adjusting the N-2 flow rate during the deposition. At low flow rate, hexagonal-closed-packed (HCP)-Ti and alpha-Ti2N phases were formed. At higher N-2 flow rate, the FCC-TiN single phase was formed predominantly. FCC-TiN film showed high hardness and elastic modulus due to covalently bonded TiN cubic phase and grain size refinement. In humid atmosphere, ultra-low friction coefficient similar to 0.025 with high wear resistance was measured in the film consisting of HCP-Ti and alpha-Ti2N phases while the hardness was 12.7 GPa. (C) 2015 Elsevier Ltd. All rights reserved.

引用

页码：25 / 30

页数：6

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