Photonic-crystal waveguide structure by pattern-integrated interference lithography

被引:13
作者
Leibovici, Matthieu C. R. [1 ]
Gaylord, Thomas K. [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
基金
美国国家科学基金会;
关键词
HOLOGRAPHIC LITHOGRAPHY; FABRICATION; TEMPLATES; INVERSION; DEFECTS; DEVICES;
D O I
10.1364/OL.40.002806
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
The pattern-integrated interference lithography (PIIL) technique combines multi-beam interference lithography (MBIL) and imaging to produce functional periodic-lattice-based microstructures in a rapid single-exposure step. A photonic-crystal waveguide structure with submicron resolution is designed, fabricated by PIIL, and characterized. Scanning electron and atomic force microscope images are found to be in good qualitative agreement with three-dimensional simulations of the developed photoresist. (C) 2015 Optical Society of America
引用
收藏
页码:2806 / 2809
页数:4
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