The pattern-integrated interference lithography (PIIL) technique combines multi-beam interference lithography (MBIL) and imaging to produce functional periodic-lattice-based microstructures in a rapid single-exposure step. A photonic-crystal waveguide structure with submicron resolution is designed, fabricated by PIIL, and characterized. Scanning electron and atomic force microscope images are found to be in good qualitative agreement with three-dimensional simulations of the developed photoresist. (C) 2015 Optical Society of America
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页码:2806 / 2809
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[Anonymous], 2009, Periodic Materials and Interference Lithography
机构:
Indian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, India
Kumar, Manish
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Joseph, Joby
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机构:
Indian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, India
机构:
Indian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, India
Kumar, Manish
;
Joseph, Joby
论文数: 0引用数: 0
h-index: 0
机构:
Indian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, IndiaIndian Inst Technol Delhi, Dept Phys, Photon Res Lab, New Delhi 110016, India