Structural, electrical and magnetic properties of Ni33Fe67 and Ni21Fe79 films deposited on SiO2/Si(100) at 633 K by DC magnetron co-sputtering

被引：0
|
作者：
Chen, Xiaobai [1 ]
Qiu, Hong [2 ]
Wu, Ping [2 ]
Tian, Yue [2 ]
机构：
[1] Beijing Technol & Business Univ, Dept Math & Phys, Beijing 100037, Peoples R China
[2] Univ Sci & Technol Beijing, Sch Appl Sci, Dept Phys, Beijing 100083, Peoples R China
来源：
PRICM 6: SIXTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, PTS 1-3 | 2007年 / 561-565卷
关键词：
Ni33Fe67 and Ni21Fe79 films; substrate temperature; structure; resistivity; magnetization; NIFE FILMS; LAYERS; SEED;
D O I：
10.4028/www.scientific.net/MSF.561-565.1141
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
180nm-thick Ni33Fe67 and Ni21Fe79 films were deposited on SiO2/Si(100) substrates at 633 K by DC magnetron co-sputtering. Structural, electrical and magnetic properties of the films were investigated using X-ray diffraction, field emission scanning electron microscopy, a four-point probe technique and an alternating gradient magnetometer. The Ni21Fe79 film has a single bee structure whereas the Ni33Fe67 film is a fcc-bcc mixed phase. The films grow with granular grains. The grain shape of the Ni21Fe79 film is triangular and rectangular. The Ni33Fe67 film consists of irregular shaped grains and a few large triangular grains. The grain size of the Ni21Fe79 film is larger than that of the Ni33Fe67 film. The resistivities of the Ni21Fe79 and Ni33Fe67 films are 1.82 x 10(-6) Omega m and 1.09 x 10(-6) Omega m. The saturation magnetization of the Ni21Fe79 and Ni33FC67 films are 1.09 x 10(6) A/m and 1.02 x 10(6) A/m. Tile coercivity of the Ni21Fe79 and Ni33FC67 films are 2.06 x 10(4) A/m and 8.84 x 10(3) A/m, respectively.
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页码：1141 / 1144
页数：4
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