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Upgraded photosensitivity under the influence of Yb doped on V2O5 thin films as an interfacial layer in MIS type Schottky barrier diode as photodiode application
被引:52
作者:
Balasubramani, V
[1
]
Chandrasekaran, J.
[1
]
Manikandan, V
[2
]
Le, Top Khac
[3
,4
]
Marnadu, R.
[1
]
Vivek, P.
[1
]
机构:
[1] Sri Ramakrishna Mission Vidyalaya Coll Arts & Sci, Coimbatore 641020, Tamil Nadu, India
[2] Kongunadu Arts & Sci Coll, Coimbatore 641029, Tamil Nadu, India
[3] Univ Ulsan, Dept Phys, Ulsan 44610, South Korea
[4] Univ Ulsan, Energy Harvest Storage Res Ctr, Ulsan 44610, South Korea
关键词:
Schottky diode;
Rare earth;
Vanadium pentoxide (V2O5);
Thin films;
Photodiode;
MIS;
ELECTRICAL-PROPERTIES;
TEMPERATURE;
NANORODS;
IMPACT;
GROWTH;
PHOTODETECTORS;
PHOTORESPONSE;
NANOPARTICLES;
TRANSITION;
CATALYST;
D O I:
10.1016/j.jssc.2021.122289
中图分类号:
O61 [无机化学];
学科分类号:
070301 ;
081704 ;
摘要:
In this study, rare earth ytterbium (Yb)-doped V2O5 thin films were effectively coated on glass and Si substrates by the sol-gel method combined with the spin coating method. The films' structural, morphological, optical, and electrical properties were investigated through XRD, FESEM, UV-Vis, and I-V electrical conductivity. Doping on V2O5 with low Yb content of 2, 4, and 6 wt % have highly affected the lattice, which is shown in tetragonal and orthorhombic structures. Morphological studies show nanorods like structured. The coated thin films yield bandgap of 3.23-3.31 eV. The electrical properties of Cu/Yb@V2O5/n-Si type Schottky barrier diode were studied, and calculated photodiode parameters like photosensitivity, photo-responsivity, external quantum efficiency, and detectivity. Predominantly, high photosensitivity of 5545.70% is obtained for the diode with 2 wt % Yb@V2O5.
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页数:10
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