Implementation and performance of a femtosecond laser mask repair system in manufacturing

被引：25

作者：

Haight, R ^{[1
]}

Hayden, D ^{[1
]}

Longo, P ^{[1
]}

Neary, T ^{[1
]}

Wagner, A ^{[1
]}

机构：

[1] IBM Corp, Thomas J Watson Res Ctr, Yorktown Heights, NY 10598 USA

来源：

18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT | 1998年 / 3546卷

关键词：

D O I：

10.1117/12.332872

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Current laser based tools for removing Cr defects are fundamentally limited due to the thermal nature of ablation carried out with nanosecond pulses. Conversely, ablation carried out with femtosecond pulses of light removes Cr in a non-thermal process. As a result, the problems of metal splatter, haze, reduced transmission and pitting of the underlying quartz common to nanosecond ablation are virtually nonexistent with femtosecond ablation of Cr. In this paper we describe a femtosecond pulsed laser mask repair system which is presently operating successfully in a manufacturing environment.

引用

页码：477 / 484

页数：8

共 8 条

[1] Casey JD, 1997, P SOC PHOTO-OPT INS, V3096, P322, DOI 10.1117/12.277264
[2] Chichkov BN, 1996, APPL PHYS A-MATER, V63, P109, DOI 10.1007/BF01567637
[3] Korner C, 1996, APPL PHYS A-MATER, V63, P123, DOI 10.1007/BF01567639
[4] THERMOPHYSICAL EFFECTS IN LASER PROCESSING OF MATERIALS WITH PICOSECOND AND FEMTOSECOND PULSES
PRONKO, PP
DUTTA, SK
DU, D
SINGH, RK
[J]. JOURNAL OF APPLIED PHYSICS, 1995, 78 (10) : 6233 - 6240
[5] TISON JK, 1987, SOLID STATE TECHNOL, P113
[6] FOCUSED ION-BEAM REPAIR OF LITHOGRAPHIC MASKS
WAGNER, A
LEVIN, JP
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1989, 37-8 : 224 - 230
[7] APPLICATIONS OF FOCUSED ION-BEAMS
WAGNER, A
[J]. NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH, 1983, 218 (1-3): : 355 - 362
[8] Yan PY, 1995, P SOC PHOTO-OPT INS, V2621, P158, DOI 10.1117/12.228166

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