Extended x-ray absorption fine structure in Ga1-xMnxN/SiC films with high Mn content

被引:3
作者
Sancho-Juan, O. [1 ]
Martinez-Criado, O. [2 ]
Cantarero, A. [1 ]
Garro, N. [1 ]
Salome, M. [2 ]
Susini, J. [2 ]
Olguin, D. [3 ]
Dhar, S. [4 ]
Ploog, K. [4 ]
机构
[1] Univ Valencia, Inst Mat Sci, E-46071 Valencia, Spain
[2] European Synchrotron Radiat Facil, F-38043 Grenoble, France
[3] Ctr Invest Estudies Arauzados, Dept Fis, Mexico City 07300, DF, Mexico
[4] Paul Drude Inst, D-10117 Berlin, Germany
来源
PHYSICAL REVIEW B | 2011年 / 83卷 / 17期
关键词
LOCAL-STRUCTURE; DOPED GAN; SEMICONDUCTORS; FERROMAGNETISM; SPECTROSCOPY; GAMNN; EDGE; TRANSITION; GROWTH;
D O I
10.1103/PhysRevB.83.172103
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, the local atomic structure of highly homogeneous Ga1-xMnxN alloy films (0.03 < x < 0.09) is analyzed by means of Mn and Ga K-edge extended x-ray absorption fine structure measurements. From the curve fitting, the structural parameters corresponding to the first two atomic shells surrounding both Ga and Mn atoms are reported. In the Ga1-xMnxN films, grown by molecular beam epitaxy, the Mn atoms are in tetrahedral configuration, independent of the Mn concentration; that is, they are in a substitutional site, Mn-Ga, in the wurtzite structure. A small increase in the interatomic distances has been found with increasing Mn content. The Debye-Waller factor does not show a significant trend as Mn content increases, which suggests the presence of short-range disorder in the GaN lattice. Ab initio calculations of the structural parameter for two different Mn concentrations are consistent with the experimental results.
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页数:4
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