Reactive magnetron sputtering of antinomy tin oxide films on glass substrate

被引：0

作者：

Liu, CC ^{[1
]}

Huang, WC ^{[1
]}

Lu, FL ^{[1
]}

Wang, CT ^{[1
]}

机构：

[1] Kun Shan Univ Technol, Dept Engn Mech, Tainan, Taiwan

来源：

Third International Conference on Experimental Mechanics and Third Conference of the Asian-Committee-on-Experimental-Mechanics, Pts 1and 2 | 2005年 / 5852卷

关键词：

antinomy tin oxide; magnetron sputtering; microstructure;

D O I：

10.1117/12.621512

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Antinomy tin oxide (ATO) films have been widely used. as a transparent conducting thin film material for application in various fields such as solar cells, opto-electronic devices, and liquid crystal displays. It has a high carrier concentration, low electrical resistivity and high transmission in the visible light range. ATO films were deposited on coming glass 1737F by low temperature reactive magnetron sputtering. The structural and surface properties of the films were determined with scanning electron microscopy, transmission electron microscopy, X-ray diffraction and atomic force microscopy. The effects of annealing temperature and atmosphere on the composition, microstructure, surface morphology, conductivity and optical properties of ATO films were investigated.

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收藏

页码：333 / 338

页数：6

相关论文

共 10 条

[1] About the structural, optical and electrical properties of SnO2 films produced by spray pyrolysis from solutions with low and high contents of fluorine [J].

Acosta, DR ;

Zironi, EP ;

Montoya, E ;

Estrada, W .

THIN SOLID FILMS, 1996, 288 (1-2) :1-7

[2] INFLUENCE OF DISCHARGE PARAMETERS ON THE LAYER PROPERTIES OF REACTIVE MAGNETRON-SPUTTERED ZNO-AL FILMS [J].

ELLMER, K ;

KUDELLA, F ;

MIENTUS, R ;

SCHIECK, R ;

FIECHTER, S .

THIN SOLID FILMS, 1994, 247 (01) :15-23

[3] The influence of post-annealing treatment on the electrical properties of In2O3 thin films prepared by an ultrasonic spray CVD process [J].

Girtan, M .

SURFACE & COATINGS TECHNOLOGY, 2004, 184 (2-3) :219-224

[4] Wet chemical deposition of ATO and ITO coatings using crystalline nanoparticles redispersable in solutions [J].

Goebbert, C ;

Nonninger, R ;

Aegerter, MA ;

Schmidt, H .

THIN SOLID FILMS, 1999, 351 (1-2) :79-84

[5] Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering [J].

Jager, S ;

Szyszka, B ;

Szczyrbowski, J ;

Brauer, G .

SURFACE & COATINGS TECHNOLOGY, 1998, 98 (1-3) :1304-1314

[6] Thickness dependence of properties of SnO2:Sb films deposited on flexible substrates [J].

Ma, HL ;

Hao, XT ;

Ma, J ;

Yang, YG ;

Huang, J ;

Zhang, DH ;

Xu, XG .

APPLIED SURFACE SCIENCE, 2002, 191 (1-4) :313-318

[7] PROPERTIES OF FLUORINE-DOPED TIN OXIDE-FILMS PRODUCED BY ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION FROM TETRAMETHYLTIN, BROMOTRIFLUOROMETHANE AND OXYGEN [J].

PROSCIA, J ;

GORDON, RG .

THIN SOLID FILMS, 1992, 214 (02) :175-187

[8] Liquid film spray deposition of transparent conducting oxide coatings [J].

Puetz, J ;

Gasparro, G ;

Aegerter, MA .

THIN SOLID FILMS, 2003, 442 (1-2) :40-43

[9] Effect of Sb doping on properties of conductive spray deposited SnO2 thin films [J].

Rajpure, KY ;

Kusumade, MN ;

Neumann-Spallart, MN ;

Bhosale, CH .

MATERIALS CHEMISTRY AND PHYSICS, 2000, 64 (03) :184-188

[10] Structural and electrical studies on highly conducting spray deposited fluorine and antimony doped SnO2 thin films from SnCl2 precursor [J].

Thangaraju, B .

THIN SOLID FILMS, 2002, 402 (1-2) :71-78