Thermal Stability of Ru-Al Multilayered Thin Films on Inconel 617

被引：8

作者：

Chen, Yung-, I ^{[1
]}

Zheng, Zhi-Ting ^{[1
]}

Jhang, Jia-Wei ^{[1
]}

机构：

[1] Natl Taiwan Ocean Univ, Inst Mat Engn, Keelung 20224, Taiwan

来源：

METALS | 2018年 / 8卷 / 07期

关键词：

multilayer; oxidation; RuAl; thermal stability; BARRIER COATINGS; PHASE-FORMATION; AL2O3; MICROSTRUCTURE; PROPERTY; ALLOYS; LAYERS; LGS;

D O I：

10.3390/met8070514

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Ru-riched and equiatomic Ru-Al multilayered thin films were fabricated on Si and Inconel 617 substrates. These thin films exhibited a multilayered structure that is caused by stacking cyclical gradient concentration through cosputtering. X-ray diffraction analysis indicated that the as-deposited Ru-Al multilayers comprised Ru and RuAl phases. Oxidation that is caused by annealing atmospheres and elements diffused from substrates was investigated. The results indicated that the inward diffusion of O at 600 degrees C in a 1% O-2-99% Ar atmosphere was restricted by the formation of an amorphous Al-oxide sublayer, and inward diffusion of O at 800 degrees C in air was limited by the formation of a crystalline Al2O3 scale. Additionally, the outward diffusion of elements from Inconel 617 penetrated the unoxidized parts of the 800 degrees C-annealed Ru-Al multilayers.

引用

页数：11

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