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Pressure-induced structural phase transformations in silicon nanowires
被引:9
|作者:
Poswal, HK
Garg, N
Sharma, SM
[1
]
Busetto, E
Sikka, SK
Gundiah, G
Deepak, FL
Rao, CNR
机构:
[1] Bhabha Atom Res Ctr, Synchrotron Radiat Sect, Bombay 400085, Maharashtra, India
[2] Sincrotron Trieste Elettra, I-34012 Trieste, Italy
[3] Off Principal Sci Adviser Govt India, New Delhi 110011, India
[4] Jawaharlal Nehru Ctr Adv Sci Res, Chem & Phys Mat Unit, Bangalore 560064, Karnataka, India
[5] Jawaharlal Nehru Ctr Adv Sci Res, CSIR, Ctr Excellence Chem, Bangalore 560064, Karnataka, India
关键词:
silicon nanowires;
phase transitions;
X-ray diffraction;
Raman scattering;
D O I:
10.1166/jnn.2005.109
中图分类号:
O6 [化学];
学科分类号:
0703 ;
摘要:
High-pressure structural behavior of silicon nanowires is investigated up to ∼ 22 GPa using angle dispersive X-ray diffraction measurements. Silicon nanowires transform from the cubic to the P-tin phase at 7.5-10.5 GPa, to the lmma phase at ∼ 14 GPa, and to the primitive hexagonal structure at ∼ 16.2 GPa. On complete release of pressure, it transforms to the metastable R8 phase. The observed sequence of phase transitions is the same as that of bulk silicon. Though the X-ray diffraction experiments do not reveal any size effect, the pressure dependence of Raman modes shows that the behavior of nanowires is in between that of the bulk crystal and porous Si.
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页码:729 / 732
页数:4
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