Growth of two-dimensional materials on hexagonal boron nitride (h-BN)

被引:22
作者
Wang, Xinsheng [1 ]
Hossein, Mongur [1 ,2 ]
Wei, Zhongming [2 ,3 ]
Xie, Liming [1 ,2 ]
机构
[1] Natl Ctr Nanosci & Technol, CAS Ctr Excellence Nanosci, CAS Key Lab Standardizat & Measurement Nanotechno, Beijing 100190, Peoples R China
[2] Univ Chinese Acad Sci, Beijing 100049, Peoples R China
[3] Inst Semicond, State Key Lab Superlattices & Microstruct, Beijing 100083, Peoples R China
关键词
two-dimensional material; boron nitride; chemical vapor deposition; transition metal dichalcogenides; molecular beam epitaxy; CHEMICAL-VAPOR-DEPOSITION; THERMAL-EXPANSION COEFFICIENT; LARGE-AREA; EPITAXIAL-GROWTH; CVD GROWTH; FEW-LAYER; MOLECULAR-CRYSTALS; MONO LAYER; MONOLAYER; MOS2;
D O I
10.1088/1361-6528/aaeb70
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
With its atomically smooth surface yet no dangling bond, chemical inertness and high temperature sustainability, the insulating hexagonal boron nitride (h-BN) can be an ideal substrate for two-dimensional (2D) material growth and device measurement. In this review, research progress on the chemical growth of 2D materials on h-BN has been summarized, such as chemical vapor deposition and molecular beam epitaxy of graphene and various transition metal dichalcogenides. Further, stacking of the as-grown 2D materials relative to h-BN, thermal expansion matching between the deposited materials and h-BN, electrical property of 2D materials on h-BN have been discussed in detail.
引用
收藏
页数:12
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