Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations

被引：39

作者：

Liao, Zeyang ^{[1
,2
]}

Al-Amri, M. ^{[3
]}

Zubairy, M. Suhail ^{[1
,2
]}

机构：

[1] Texas A&M Univ, Inst Quantum Studies, College Stn, TX 77843 USA

[2] Texas A&M Univ, Dept Phys & Astron, College Stn, TX 77843 USA

[3] KACST, Natl Ctr Math & Phys, Riyadh 11442, Saudi Arabia

来源：

PHYSICAL REVIEW LETTERS | 2010年 / 105卷 / 18期

关键词：

INTERFEROMETRIC OPTICAL LITHOGRAPHY; EXPLOITING ENTANGLEMENT; FLUORESCENCE MICROSCOPY; RESOLUTION; PULSES; BEAT;

D O I：

10.1103/PhysRevLett.105.183601

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology.

引用

页数：4

共 45 条

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