Localization factor: A new parameter for the quantitative characterization of surface structure with atomic force microscopy (AFM)

被引：20

作者：

Bonyar, Attila ^{[1
]}

Molnar, Laszlo Milan ^{[1
]}

Harsanyi, Gabor ^{[1
]}

机构：

[1] Budapest Univ Technol & Econ, Dept Elect Technol, H-1111 Budapest, Hungary

来源：

MICRON | 2012年 / 43卷 / 2-3期

关键词：

Localization factor; Structural entropy; AFM; Surface roughness; SELF-ASSEMBLED MONOLAYERS; IMPEDANCE; ROUGHNESS; ELECTRODES; DNA; CPE;

D O I：

10.1016/j.micron.2011.09.005

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

In this work we present the possible application of a new parameter called localization factor for the quantitative characterization of surface structures with atomic force microscopy (AFM). For this purpose contact mode AFM images were taken from technologically different polycrystalline gold thin films and were evaluated according to the following parameters: surface roughness (R-a, R-RMS), roughness factor (f(r)) and localization factor. The localization factor was compared with the other surface parameters. We demonstrate that this new parameter can be used to identically characterize these gold thin film surfaces with contact mode AFM in the 1-1000 mu m(2) scan range. The mathematical background and possible application fields of the localization factor are also discussed in our paper. (C) 2011 Elsevier Ltd. All rights reserved.

引用

页码：305 / 310

页数：6

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