Structural, morphological and optical properties of electron beam evaporated WO3 thin films

被引:18
作者
Babu, M. Bujji [1 ]
Madhuri, K. V. [1 ]
机构
[1] VFSTR Univ, Dept S & H, Thin Film Lab, Vadlamudi 522213, Andhra Pradesh, India
关键词
WO3 thin films; Electron beam evaporation; Structure; Morphology; Optical properties; ELECTROCHROMIC PROPERTIES; TUNGSTEN-OXIDE; ABSORPTION; GROWTH;
D O I
10.1016/j.jtrusci.2016.12.003
中图分类号
O [数理科学和化学]; P [天文学、地球科学]; Q [生物科学]; N [自然科学总论];
学科分类号
07 ; 0710 ; 09 ;
摘要
Tungsten trioxide (WO3) is one of the best transparent metal oxides for advanced technological applications. WO3 exhibits a wide variety of novel properties, particularly in thin film form. This investigation focuses on the morphological and optical properties of W03 thin films prepared by electron beam deposition in an oxygen partial pressure of 2 x 10(-4) mbar and at various substrate temperatures. The deposited films at room temperature (RT) are amorphous, but the crystallinity is enhanced by increasing the substrate temperature with noticeable x-ray diffraction peaks at (320), (210) and (402). The peaks represent the predominantly orthorhombic phase, with a portion of the hexagonal phase being included, of the W03 films. The surface roughness and the grain size also increased as the substrate temperature increased. The optical transmittance and energy band gaps decreased with increasing substrate temperature. The band gap energy values were from 3.302 to 3.084 eV for the films deposited at substrate temperatures ranging from RT to 450 degrees C. (C) 2017 The Authors. Production and hosting by Elsevier B.V. on behalf of Taibah University. This is an open access article under the CC BY-NC-ND license
引用
收藏
页码:1232 / 1237
页数:6
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