Electrical conductivity relaxation in thin-film yttria-stabilized zirconia

被引:70
|
作者
Rivera, A [1 ]
Santamaría, J [1 ]
León, C [1 ]
机构
[1] Univ Complutense Madrid, Fac Ciencias Fis, Dept Fis Aplicada 3, GFMC, E-28040 Madrid, Spain
关键词
D O I
10.1063/1.1343852
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on complex admittance measurements on ZrO2:Y2O3 (YSZ) thin films in the parallel plate geometry. Highly textured YSZ thin films, grown by rf sputtering, allow measuring complex admittance free of the effect of charge blocking at grain boundaries. We have examined low-temperature (close to room temperature) regime dominated by association of oxygen vacancies. Complex admittance analyzed in terms of the modulus formalism supplies information on correlation effects in ion motion and allows obtaining an association energy for the oxygen vacancies of 0.45 eV, in agreement with previous theoretical calculations. (C) 2001 American Institute of Physics.
引用
收藏
页码:610 / 612
页数:3
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