Analysis of Laser-induced Damage in Optical Thin Film Based on ANSYS

被引：0
作者：
Wang, Fei [1 ]
Chen, Kejun [1 ]
Gao, Fan [1 ,2 ,3 ,4 ]
Yuan, Xiao [1 ,2 ,3 ,4 ]
机构：
[1] Soochow Univ, Coll Optoelect Sci & Engn, Suzhou 215006, Jiangsu, Peoples R China
[2] Soochow Univ, Collaborat Innovat Ctr Suzhou Nano Sci & Technol, Suzhou 215006, Jiangsu, Peoples R China
[3] Minist China, Key Lab Adv Opt Mfg Technol Jiangsu Prov, Suzhou 215006, Jiangsu, Peoples R China
[4] Minist China, Key Lab Modern Opt Technol, Educ Minist China, Suzhou 215006, Jiangsu, Peoples R China
来源：
TENTH INTERNATIONAL CONFERENCE ON INFORMATION OPTICS AND PHOTONICS | 2018年 / 10964卷
关键词：
optical thin film; finite element method; Fourier heat conduction; THRESHOLD; COATINGS;
D O I：
10.1117/12.2505819
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
The electric and thermal effects of optical thin film irradiated by Gaussian-pulsed laser are simulated with finite element method (FEM) based on the software ANSYS. The electric field intensity distribution of HfO2/SiO2 high reflective (HR) film is investigated. The transient heat-conduction model of the film is established for the calculation of temperature field of optical thin film coating. Simulation results show that, multilayer films are more prone to damage than single film, and the upper layer of HfO2 layer in the spot center may easily be damaged.
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页数：6
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