Low-temperature growth of single-walled carbon nanotubes by water plasma chemical vapor deposition

被引：69

作者：

Min, YS ^{[1
]}

Bae, EJ ^{[1
]}

Oh, BS ^{[1
]}

Kang, D ^{[1
]}

Park, W ^{[1
]}

机构：

[1] Samsung Adv Inst Technol, Mat & Devices Res Ctr, Yongin 449712, Kyeongki, South Korea

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 2005年 / 127卷 / 36期

关键词：

D O I：

10.1021/ja054108w

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Preferential growth of pure single-walled carbon nanotubes (SWNTs) over multi-walled carbon nanotubes (MWNTs) was demonstrated at low temperature by water plasma chemical vapor deposition. Water plasma lowered the growth temperature down to 450 °C, and the grown nanotubes were single-walled without carbonaceous impurities and MWNTs. The preferential growth of pure SWNTs over MWNTs was proven with micro-Raman spectroscopy, high-resolution transmission electron microscopy, and electrical characterization of the grown nanotube networks. Copyright © 2005 American Chemical Society.

引用

页码：12498 / 12499

页数：2

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