A study on the microstructures and mechanical properties of pulsed DC reactive magnetron sputtered Cr-Si-N nanocomposite coatings

被引：40

作者：

Lee, Jyh-Wei ^{[1
,2
,3
]}

Chang, Yue-Chyuan ^{[3
]}

机构：

[1] Tung Nan Inst Technol, Dept Mech Engn, Taipei, Taiwan

[2] Tung Nan Inst Technol, Res Ctr Micro Nanotechnol, Taipei, Taiwan

[3] Tung Nan Inst Technol, Inst Mechatron Engn, Taipei, Taiwan

来源：

SURFACE & COATINGS TECHNOLOGY | 2007年 / 202卷 / 4-7期

关键词：

Cr-Si-N thin film; pulsed DC reactive magnetron sputtering; nanoscratch; nanowear;

D O I：

10.1016/j.surfcoat.2007.05.066

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

The nanocomposite Cr-Si-N thin films with various Si contents have been prepared by a bipolar asymmetric pulsed DC reactive magnetron sputtering system. The Cr-Si-N coatings exhibit a mixed CrN and Cr2N phases when Si contents is lower than 3.1 at.%, whereas a single CrN phase is observed for coatings with higher Si content. The crystallite size of Cr-Si-N decreases with increasing Si content and reaches to a minimum of 5.2 nm when the Si content is 10.1 at.%. A high hardness, low friction coefficient and good nanowear resistance are found in the Cr-Si-N coatings with around 10.1 at.% Si in this work. (C) 2007 Elsevier B.V. All rights reserved.

引用

页码：831 / 836

页数：6

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