Scanning near-field ellipsometric microscope-imaging ellipsometry with a lateral resolution in nanometer range

被引：26

作者：

Karageorgiev, P ^{[1
]}

Orendi, H ^{[1
]}

Stiller, B ^{[1
]}

Brehmer, L ^{[1
]}

机构：

[1] Univ Potsdam, Inst Phys, D-14415 Potsdam, Germany

来源：

APPLIED PHYSICS LETTERS | 2001年 / 79卷 / 11期

关键词：

D O I：

10.1063/1.1403237

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

An apertureless optical near-field scanning microscope system has been created by combining a commercially available atomic force microscope and an ellipsometer without any prior changes in design of the respective devices. In preliminary experiments, an optical resolution of about 20 nm (lambda /32) has been achieved using the combined microscope. The intensity of the measured optical signal has been found to be a periodic function of the thickness of the sample. Moreover, the period of this function is dependent upon the local optical properties of the sample material. (C) 2001 American Institute of Physics.

引用

页码：1730 / 1732

页数：3

共 20 条

[1]

AZZAM RMA, 1977, ELLIPSOMETRY POLARIZ, P284

[2] CORRELATION BETWEEN OPTICAL AND TOPOGRAPHICAL IMAGES FROM AN EXTERNAL REFLECTION NEAR-FIELD MICROSCOPE WITH SHEAR FORCE FEEDBACK [J].