Two-dimensional simulation of a hot-filament chemical vapor deposition reactor

A two-dimensional model of a hot-filament (HF) CVD reactor has been developed to study the gas-phase and surface processes of diamond growth. Full transport equations were solved numerically to calculate the gas temperature, fluid flow, and species concentration fields. Catalytic chemistry at the filament surface was considered. The distribution of the hydrogen atom concentration and the gas temperature in an HFCVD reactor were obtained analytically. The expressions for diamond growth rate and the hydrogen atom destruction coefficient at the substrate were derived from the surface kinetics. The gas-phase reaction mechanism was obtained using a brute force sensitivity analysis. The calculated results were compared with existing experimental data.