Plasmonic, Low-Frequency Raman, and Nonlinear Optical-Limiting Studies in Copper-Silica Nanocomposites

被引：37

作者：

Mohapatra, Satyabrata ^{[1
]}

Mishra, Y. K. ^{[2
]}

Warrier, A. M. ^{[3
]}

Philip, Reji ^{[3
]}

Sahoo, S. ^{[4
]}

Arora, A. K. ^{[4
]}

Avasthi, D. K. ^{[5
]}

机构：

[1] Guru Gobind Singh Indraprastha Univ, Sch Basic & Appl Sci, New Delhi 110075, India

[2] Univ Kiel, Inst Mat Sci, D-24143 Kiel, Germany

[3] Raman Res Inst, Light & Matter Phys Grp, Bangalore 560080, Karnataka, India

[4] Indira Gandhi Ctr Atom Res, Condensed Matter Phys Div, Kalpakkam 603102, Tamil Nadu, India

[5] Inter Univ Accelerator Ctr, New Delhi 110067, India

来源：

PLASMONICS | 2012年 / 7卷 / 01期

关键词：

Plasmonic nanocomposites; Nonlinear absorption; Optical limiting; Surface plasmon resonance; RESONANCE; FLUORESCENCE; NANOPARTICLES; EXCITATION; 2-PHOTON; FILMS; SIZE;

D O I：

10.1007/s11468-011-9271-y

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Nanocomposite thin films consisting of Cu nanoparticles embedded in silica matrix were synthesized by atom beam co-sputtering technique. Plasmonic, optical, and structural properties of the nanocomposite films were investigated by using ultraviolet (UV)-visible absorption spectroscopy, nonlinear optical transmission, X-ray diffraction (XRD), and low-frequency Raman scattering. UV-visible absorption studies revealed the surface plasmon resonance absorption at 564 nm which showed a red shift with increase in Cu fraction. XRD results together with surface plasmon resonance absorption confirmed the presence of Cu nanoparticles of different size. Low-frequency Raman studies of nanocomposite films revealed breathing modes in Cu nanoparticles. Nanocomposites with lower metal fractions were found to behave like optical limiters. The possibility of controllably tuning the optical nonlinearity of these nanocomposites could enable them to be the potential candidates for applications in nanophotonics.

引用

页码：25 / 31

页数：7

共 39 条

[21] Synthesis of Au nanoparticles in partially oxidized Si matrix by atom beam sputtering [J].