Highly efficient near-field thermal rectification between InSb and graphene-coated SiO2

被引:24
作者
Xu, Guoding [1 ]
Sun, Jian [1 ]
Mao, Hongmin [1 ]
Pan, Tao [1 ]
机构
[1] Suzhou Univ Sci & Technol, Jiangsu Key Lab Micro & Nano Heat Fluid Flow Tech, Sch Math & Phys, Suzhou 215009, Peoples R China
关键词
Near-field radiation; Graphene; Radiative heat flux; Thermal rectification efficiency; RADIATIVE HEAT-TRANSFER; ENERGY-TRANSFER; PERFORMANCE; DEVICES; SILICON;
D O I
10.1016/j.jqsrt.2018.09.014
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We report a highly efficient thermal rectification model based on the near-field thermal radiation between InSb and graphene-coated SiO2, separated by nanoscale vacuum gaps. The results show that the introduction of graphene sheet enhances significantly near-field radiative heat flux and thermal rectification efficiency owing to the strong coupling of surface plasmon-polaritons between InSb and graphene. Specifically, under the same temperature bias, a rectification efficiency exceeding 80% is obtained at vacuum gaps varying from 10 nm to 100 nm for the graphene-coated SiO2 case, while such an efficiency requires a narrower gap between 10 nm to 20 nm for the bare SiO2 case. In addition, the introduction of graphene can lower greatly the emitter's temperature T-H, e.g., an efficiency of 60% requires T-H = 550 K in the bare SiO2 case, while it requires only the temperature around 400 K in the coated SiO2 case. The above results might be helpful in designing a highly efficient thermal diode with a wider vacuum gap and a lower operating temperature. (C) 2018 Elsevier Ltd. All rights reserved.
引用
收藏
页码:140 / 147
页数:8
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